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Journal of Psychopathology and Behavioral Assessment

Gepubliceerd in:

17-04-2015

The Psychometric Properties and Factor Structure of the Antisocial Process Screening Device Self-Report Version in Chinese Adolescents

Auteurs: Meng-Cheng Wang, Qiaowen Deng, Cherie Armour, XiangYang Bi, Hong Zeng

Gepubliceerd in: Journal of Psychopathology and Behavioral Assessment | Uitgave 4/2015

Abstract

The present study examined the factor structure, internal consistency and criterion validity of the Antisocial Process Screening Device-Self-Report (APSD-SR) in a large sample of Chinese community youth with an average age of 13.89 (SD = 1.27) years. Both exploratory and confirmatory factor analysis supported a four factor solution (Impulsivity [IMP], Callous-Unemotional [CU], Narcissism [NAR], and Asocial behavior [ASO]). The internal consistencies of the APSD total scale and subscales were low to marginal, which were comparable with previous studies. Moreover, the APSD scores were related to criterion variables in ways consistent with predictions based on the new four-factor model. Our findings support the overall utility of the APSD-SR preliminarily for assessing antisocial behavior and psychopathic traits in Chinese community youth.

vorige artikel Empathy Faking in Psychopathic Offenders: The Vulnerability of Empathy Measures

volgende artikel The Youth Psychopathic Traits Inventory-Short Version in Spanish Adolescents—Factor Structure, Reliability, and Relation with Aggression, Bullying, and Cyber Bullying

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Titel: The Psychometric Properties and Factor Structure of the Antisocial Process Screening Device Self-Report Version in Chinese Adolescents
Auteurs: Meng-Cheng Wang
Qiaowen Deng
Cherie Armour
XiangYang Bi
Hong Zeng
Publicatiedatum: 17-04-2015
Uitgeverij: Springer US
Gepubliceerd in: Journal of Psychopathology and Behavioral Assessment / Uitgave 4/2015
Print ISSN: 0882-2689
Elektronisch ISSN: 1573-3505
DOI: https://doi.org/10.1007/s10862-015-9486-x

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